IITB Nanofab
Dec ’25 — now
Dec ’25 — now
Fabrication of Oxide-Channel Thin-Film Transistors for eDRAM Technology
Guide: Prof. Veeresh Deshpande, Dept. of Electrical Engineering
- Utilized fabrication tools like Atomic Layer Deposition (ALD), RF Sputter, Photolithography (Laser Writer)
- Pulsed IV using Waveform Generator/Fast Measurement Unit (WGFMU), and measured gate stack thickness using Ellipsometer, and surface topology using Profilometer.
- Designed lithography masks (KLayout, Python scripting) with 100nm-length channels, for Electron Beam Lithography tool.
- Currently fabricating Dual Gate ITO channel FETs and studying gate oxide optimization.